The FEI Inspect S SEM is equipped with a tungsten filament, secondary electron detector for standard imaging, a back scattered electron detector, Thermo Noran System Six X-ray microanalysis system (EDS), and a J.C. Nabity Nanometer Pattern Generation Sytem (NPGS) for electron beam patterning and lithography. The SEM will be capable of patterning 80 nm or less line widths. The EDS system provides chemical elemental composition of samples. Additionally the SEM can be operated in environmental mode with variable pressures ranging from 0.6 Torr to 0.08 Torr. Image digital resolution up to 4096 x 3536.
Imaging Modes: Secondary Electron Imaging, Back Scattered Electron Imaging, Low Vacuum Imaging, Energy-Dispersive X-ray Spectroscopy (EDS), and J.C. Nabity E-beam Lithography.
PUBLICATION ACKNOWLEDGEMENT: All SEM images and data were collected in the W.M. Keck Center for Nano-Scale Imaging in the Department of Chemistry and Biochemistry at the University of Arizona with funding from the W.M. Keck Foundation Grant.